PRODUCT

PSP Vacuum

ION SOURCE FOR SAMPLE CLEANING

ISIS3000

DESCRIPTION

Ion source for Sample cleaning
Model ISIS3000



· A UHV compatible, high beam current, variable energy ion source for cleaning
  of sample surfaces under UHV.
· Variable energy 100 – 3000eV suitable for all types of samples.
· Lower beam energies are used to minimize damage to delicate sample
  surfaces such as single crystals.
· Higher beam energies are used for rapid etching of oxides and semiconductors.
· High beam currents available even at low energy.
· Used with any inert gas, which is leaked directly into the discharge chamber,
no differential pumping required.
· Broad 10mm spot, no raster unit required to clean large area.
· Long working distance to avoid conflict with other instrumentation.
· Cost effective solution for sample cleaning under UHV.